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Study of Supercritical Carbon Dioxide/n-Butyl Acetate Co-solvent System with High Selectivity in Photoresist Removal Process

Kim DW Heo H Lim KT
Vol. 23, No. 4, pp. 357-363, Dec. 2017

10.7464/ksct.2017.23.4.357

Supercritical carbon dioxide

Negative photoresist

n-butyl acetate